The metal element Titanium can react with oxygen to form various oxides, including titanium monoxide (TiO), titanium dioxide (TiO2), titanium sesquioxide (Ti2O3) and titanium pentoxide (Ti3O5).
All of the titanium oxides will be evaporated and subsequently oxidized to the final stable phase TiO2. Titanium dioxide thin films are widely used as durable protective coatings in multilayer structures of laser mirrors, beam splitters, cold mirrors and heat mirrors.
|Material Type||Titanium (IV) Oxide|
|Melting Point (°C)||1,830|
|Theoretical Density (g/cc)||4.23|
|Comments||Suboxide, must be reoxidized to rutile. Ta reduces TiO2 to TiO and Ti.|
Titanium dioxide film has excellent optical properties. It is known to us that the refractive index is one of the basic properties of optical materials, and it is closely related to the electron polarizability of ions and the local field within the material. The evaluation of the refractive index of optical materials is important, especially for applications in integrated optics such as switches, filters and modulators. Therefore, the refractive index of the material is a key parameter in device design.
Apart from it, TiO2 film also maintains high thermal stability, chemical stability and durability in harsh environments. More importantly, titanium dioxide has high transmittance and high refractive index in the visible spectrum, so they are suitable for making anti-reflective coatings, multilayer optical coatings (used as optical filters), photovoltaic devices and photocatalysts, etc.
Titanium dioxide (TiO2) films are widely used as high refractive index thin film materials in the visible light region. It is a perfect combination with SiO2, which is commonly used as a low refractive index thin film material to produce a thin film multilayer dielectric coating composed of alternating layers of a high refractive index material and a low refractive index material.
The titanium dioxide film is usually obtained by sputtering or vacuum evaporation, and the materials used in the two processes are referred to as a titanium dioxide sputtering target and titanium dioxide evaporation materials, respectively. Several parameters (raw material purity, vacuum tightness, reaction time, etc.) should be carefully controlled during the deposition process to prepare a high-quality TiO2 film.
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